Science · 1977 · 55 citations · 14 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsElectron Beam LithographyIntegrated Circuit DesignIntegrated Circuit FabricationSemiconductor Device MaterialsThermal Properties Of SemiconductorsDevice FabricationLimitsPower Density DistributionPower DistributionTechnology ScalingThermal Management Of Semiconductor Devices
Although the limitations of the methods of lithography in use at a particular time are easily recognized and attract substantial attention, experience shows that technological ingenuity keeps pushing them to ever-smaller dimensions. There seems to be no fundamental reason to expect that lithographic limits will not continue to recede. The limits to the advance of miniaturization are to be found in the ability of materials to withstand high electric fields and in the ability of packaging technology to remove heat from active components and provide for power distribution, signal interconnection, and flexible mechanical assembly.
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Logical Reversibility of Computation
C. H. Bennett · IBM Journal of Research and Development · 1973 · 3.7K citations
A. V. Crewe, J.S. Wall, John P. Langmore · Science · 1970 · 751 citations
Natural Sciences, Chemistry, Physics +15
Electron-beam fabrication of 80-Å metal structures
A. N. Broers, W. W. Molzen, J. J. Cuomo et al. · Applied Physics Letters · 1976 · 306 citations