Novel organometallic starting materials for group III–V semiconductor metal-organic chemical vapour deposition

M. Hostalek, L. Pohl, A. Brauers, P. Balk, V. Frese, H. Hardtdegen, R. Hövel, G.K. Regel, A. Molassioti, M. Moser,

Thin Solid Films · 1989 · 22 citations · 15 references

Concepts

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