Novel organometallic starting materials for group III–V semiconductor metal-organic chemical vapour deposition - Concepedia

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Novel organometallic starting materials for group III–V semiconductor metal-organic chemical vapour deposition

22

Citations

15

References

1989

Year

M. Hostalek, L. Pohl, A. Brauers, P. Balk, V. Frese, H. Hardtdegen, R. Hövel, G.K. Regel, A. Molassioti, M. Moser,

Thin Solid Films

Materials ScienceEngineeringChemistryChemical DepositionFunctional MaterialsChemical Vapor Deposition

References

	Year	Citations

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