The formation of TiSi2 by RTA processing

Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/

J. B. Lasky, James Nakos, O.J. Cain et al. · IEEE Transactions on Electron Devices · 1991 · 346 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thin film interaction between titanium and polycrystalline silicon

S. P. Murarka, D. B. Fraser · Journal of Applied Physics · 1980 · 190 citations

Natural Sciences, Materials Engineering, Materials Science +17

A kinetic model for solid-state silicide nucleation

R. W. Bené · Journal of Applied Physics · 1987 · 151 citations

Natural Sciences, Chemistry, Materials Science +17

Silicide and Schottky barrier formation in the Ti-Si and the Ti-SiO<i>x</i> -Si systems

Marc A. Taubenblatt, C. R. Helms · Journal of Applied Physics · 1982 · 126 citations

Engineering, Materials Engineering, Materials Science +17

Refractory metal silicides: Thin-film properties and processing technology

T. Paul Chow, A. J. Steckl · IEEE Transactions on Electron Devices · 1983 · 113 citations

Engineering, Electrical Engineering, Materials Science +17