Proceedings of the IEEE · 1971 · 25 citations · 2 references
Natural SciencesElectrical EngineeringPhysicsElectronic MaterialsMaterials PhysicsThin FilmsCarrier TransportCharge Carrier TransportElectrical ConductivityElectron TransportThin Film Electrical PropertiesThin-film MaterialsConductivity In Thin FilmsCurrent DensityElectrical Transport PropertiesElectromigrationElectromigration AnalysisElectron TransferMomentum TransferThin-film Conductors
Comments are made on a recent paper by Hofman and Breitling on the rate of electromigration in thin films. It is shown that the simple concept of electron momentum transfer leads to a quadratic relation between the current density and rate of electromigration, in agreement with Black. Comments on the difficulty of relating this rate to failure times of metal conductors are also presented.
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