Concepedia

A novel silicon containing chemical amplification resist for electron beam lithography

H. Watanabe, Y. Todokoro, M. Inoue

Microelectronic Engineering · 1991 · 13 citations · 3 references

DOI

Concepts

References

3

Chemical amplification in the design of dry developing resist materials

Hiroshi Itô, C. Grant Willson · Polymer Engineering and Science · 1983 · 467 citations

, , +16

A Silicon Containing Positive Photoresist (SIPR) for a Bilayer Resist System

Yasunori Saotome, H. Gokan, K. Saigo et al. · Journal of The Electrochemical Society · 1985 · 31 citations

, , +17

The Preparation and Properties of a Polysiloxane Electron Resist

E. D. Roberts · Journal of The Electrochemical Society · 1973 · 28 citations

, , +15