InAs/AlGaSb heterojunction tunnel field‐effect transistor with tunnelling in‐line with the gate field

Rui Li, Yeqing Lu, Soo Doo Chae, Guangle Zhou, Qingmin Liu, Chen Chen, Mohammad Shahriar Rahman, T. Vasen, Qin Zhang, Patrick Fay,

Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2011 · 43 citations · 0 references

Concepts

Abstract

Abstract The first fabrication of a III‐V tunnel field‐effect transistor (TFET) with tunneling directed perpendicular to the gate is reported. This new transistor geometry utilizes an InAs/Al 0.45 Ga 0.55 Sb staggered‐gap tunnel junction intended for high on current and steep subthreshold swing. The first measurements of the transistor transport properties at room temperature and ‐50 °C are provided. Tunneling transport is confirmed by the observation of negative differential resistance in the tunnel junction in the forward bias polarity. Transistor on‐current of 21 μA/μm at 0.3 V and subthreshold swing of 830 mV/decade is found. The large subthreshold swing is consistent with the large density of interface traps at the oxide/semiconductor interface (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)