Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress

High Rate Thick Film Growth

John A. Thornton · Annual Review of Materials Science · 1977 · 2.1K citations

Natural Sciences, Materials Engineering, Materials Science +12

Revised structure zone model for thin film physical structure

R. Messier, Anupam Giri, R. Roy · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 945 citations

Natural Sciences, Materials Science, Physics +12

Reactive sputtering of TiN films at large substrate to target distances

J. Musil, S. Kadlec · Vacuum · 1990 · 112 citations

Natural Sciences, Materials Engineering, Materials Science +12

Ion-assisted sputtering of TiN films

J. Musil, S. Kadlec, V. Valvoda et al. · Surface and Coatings Technology · 1990 · 88 citations

Natural Sciences, Materials Engineering, Materials Science +12

Reactive deposition of tin films using an unbalanced magnetron

S. Kadlec, J. Musil, W.‐D. Münz et al. · Surface and Coatings Technology · 1989 · 69 citations

Natural Sciences, Materials Engineering, Materials Science +11