High temperature silicon carbide MOSFETs with verylow drain leakage current

T. Billon, T. Ouisse, P. Lassagne, C. Jassaud, J.L. Ponthenier, L. Baud, N. Bécourt, P. Morfouli

Electronics Letters · 1994 · 24 citations · 5 references

Concepts

Abstract

Inversion mode n-channel MOSFETs have been built on (6H) silicon carbide (SiC) substrates, with thermal oxide as the gate insulator, and with channel lengths ranging from 1 to 25 µm. Drain leakage currents lower than 0.04 pA/µm channel width have been experimentally obtained at temperatures up to 400° C and Vd = 5V.

References

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