Electronics Letters · 1994 · 24 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsComplementary Metal-oxide-semiconductor TechnologyLeakage Power ReductionMetal-oxide-semiconductor Field-effect TransistorsOxide SemiconductorsSemiconductor Device MaterialsSemiconductor PhysicsGate Oxide LeakageSilicon CarbideSilicon Carbide (Sic) MaterialsSilicon Carbide Power DevicesSource-drain Leakage
Inversion mode n-channel MOSFETs have been built on (6H) silicon carbide (SiC) substrates, with thermal oxide as the gate insulator, and with channel lengths ranging from 1 to 25 µm. Drain leakage currents lower than 0.04 pA/µm channel width have been experimentally obtained at temperatures up to 400° C and Vd = 5V.
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New method for the extraction of MOSFET parameters
G. Ghibaudo · Electronics Letters · 1988 · 831 citations
6H-silicon carbide devices and applications
John W. Palmour, J. A. Edmond, Hoyoul Kong et al. · Physica B Condensed Matter · 1993 · 186 citations