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<title>Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology</title>
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2000
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Optical MaterialsEngineeringElectron-beam LithographyEuv LithographyOptic DesignMechanical EngineeringEducationBeam LithographyOptical Fabrication TechnologyInstrumentationSpecific Euvl MirrorsGraded-reflectivity MirrorsNanolithography MethodMaterials ScienceFabrication TechniqueFabrication ConceptsMicrofabricationCarl ZeissApplied PhysicsTechnology
In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.