<title>Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology</title>

Udo Dinger, F. Eisert, Holger Lasser, Maximilian Mayer, Andreas Seifert, Guenther Seitz, Siegfried Stacklies, F. Stickel, M. Weiser

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 37 citations · 0 references

Concepts

Abstract

In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.