2012 · 75 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesCmos Circuit DesignMemory DevicesMemristive MaterialsShort-channel EffectsEnduranceEndurance CharacteristicsMemristive MemoryNon-volatile Memory DesignNonvolatile Memory MaterialsResistive Random-access MemoryResistive SwitchingTransition Metal Oxides
A non-linear RRAM cell with sub-1μA ultralow operating current has been successfully fabricated for high density vertical ReRAM (VRRAM) applications. A uniform and reproducible low power resistive switching was achieved by engineering transition metal oxides and imposing thin insulating layer as a tunnel barrier. The non-linear I-V characteristics ensure the possible incorporation of RRAM cell into high density cross-type array structure including VRRAM. By varying the current compliance, a multi level switching behavior was obtained. Moreover, excellent endurance of more than 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">7</sup> cycles without read disturbance for up to 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sup> seconds was demonstrated.
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Realization of vertical resistive memory (VRRAM) using cost effective 3D process
In-Hwan Baek, Chanyeol Park, Hyunsu Ju et al. · 2011 · 134 citations
Natural Sciences, Materials Engineering, Materials Science +17
3D approaches for non-volatile memory
Jungdal Choi, Kwang Soo Seol · Symposium on VLSI Technology · 2011 · 37 citations