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Thermal Stability of Defect Centers in n- and p-Type 4H-SiC Epilayers Generated by Irradiation with High-Energy Electrons
13
Citations
5
References
2010
Year
Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringPhysicsNanoelectronicsBias Temperature InstabilityApplied PhysicsPower Semiconductor DeviceHigh-energy ElectronsDefect FormationStructural CeramicDefect ToleranceDefect CentersThermal StabilityCarbideMicroelectronics
This paper comprises a systematic study of the thermal stability of defect centers observed in n- and p-type 4H-SiC by deep level transient spectroscopy (DLTS); the defects are generated by irradiation with high-energy electrons of 170 keV or 1 MeV.
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