Yield point and dislocation mobility in silicon and germanium

W. Schröter, H. G. Brion, H. Siethoff

Journal of Applied Physics · 1983 · 83 citations · 12 references

Concepts

Abstract

Measurements of the lower yield point in silicon and germanium, covering wide ranges of temperature and strain rate, are presented. The results indicate that Haasen’s model for the beginning of the plastic deformation of semiconductors has to be modified for germanium, while it is confirmed for silicon.

References

12