Finite element modeling for chemical mechanical polishing process under different back pressures

Optimization of computer controlled polishing

Richard A. Jones · Applied Optics · 1977 · 250 citations

1/80-Wave Rms Departure, Engineering, Industrial Engineering +18

Tribology Analysis of Chemical‐Mechanical Polishing

Scott R. Runnels, L. Michael Eyman · Journal of The Electrochemical Society · 1994 · 244 citations

Materials Science, Tribology Analysis, Tribological Coating +13

Von Mises Stress in Chemical‐Mechanical Polishing Processes

Duo Wang, J. Lee, Karey Holland et al. · Journal of The Electrochemical Society · 1997 · 171 citations

Von Mises Stress, Engineering, Mechanical Engineering +16

A Model for Mechanical Wear and Abrasive Particle Adhesion during the Chemical Mechanical Polishing Process

Goodarz Ahmadi, Xun Xia · Journal of The Electrochemical Society · 2001 · 129 citations

Engineering, Mechanical Engineering, Surface Removal +17

A Two‐Dimensional Process Model for Chemimechanical Polish Planarization

J. Warnock · Journal of The Electrochemical Society · 1991 · 106 citations

Materials Science, Two‐dimensional Process Model, Engineering +12