Ultrathin Aluminum Oxide Tunnel Barriers

Abstract

Ballistic electron emission microscopy is used to study the formation of ultrathin tunnel barriers by the oxidization of aluminum. An O2 exposure, approximately 30 mTorr sec, forms a uniform tunnel barrier with a barrier height straight phi(b) of 1.2 eV. Greater O2 exposure does not alter straight phi(b) or the ballistic transmissivity of the oxide conduction band. Tunneling spectroscopy indicates a broad energy distribution of electronic states in the oxide. With increasing O2 dose the states below 1.2 eV gradually become localized, but until this localization is complete these states can provide low-energy single-electron channels through the oxide.