Journal of Applied Physics · 2010 · 34 citations · 37 references
Natural SciencesMaterials SciencePhysicsOpticsPlasma PhysicsSpectroscopyEmission SpectroscopyHigh-temperature PlasmasLaser PhysicsLaser SpectroscopyLaser-plasma InteractionsPlasma DiagnosticsEuv EmissionExtreme Ultraviolet EmissionExtreme Ultraviolet LithographyFaraday CupsOptical Emission SpectroscopyPlasma Emission SpectroscopyPlasma ProcessesPlasma Source Diagnostics
Tin and lithium plasmas emit efficiently in the in-band region (13.5 nm with 2% bandwidth) necessary for extreme ultraviolet (EUV) lithography. We have made a detailed comparison of the atomic and ionic debris, as well as the emission features of Sn and Li plasmas under identical experimental conditions. Planar slabs of pure Sn and Li were irradiated with 1064 nm, 9 ns neodymium-doped yttrium aluminum garnet laser pulses for producing plasmas. A suite of diagnostics were used to analyze the emission and debris features, including optical emission spectroscopy (OES), a Faraday cup, an EUV pinhole camera, the absolute measurement of EUV conversion efficiency (CE), etc. Our results show that Sn plasmas provide a CE nearly twice that of Li. However, the kinetic energies of Sn ions are considerably higher, though with a lower flux. OES studies have showed that the kinetic energies of neutral species are substantially lower compared to that of the charged particle species.
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Pushing the limits of lithography
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Temperature and density of an expanding laser produced plasma
P. T. Rumsby, J. W. M. Paul · Plasma Physics · 1974 · 142 citations
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Natural Sciences, Physics, Optics +16