Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, T. Okuno, Nobuyoshi Ueda, Tsuyoshi Andô, Yezheng Tao, Yoshinori Shimada,

Physical Review Letters · 2005 · 169 citations · 23 references

Concepts

Abstract

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

References

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