A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry - Concepedia

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A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry

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1998

Year

Stefan De Gendt, Preston T. Snee, Ingrid Cornelissen, Marcel Lux, Rita Vos, Paul Mertens, D. Martin Knotter, M. Meuris, Marc Heyns

Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

Advanced Oxidation ProcessChemical EngineeringEnvironmental ChemistryEngineeringEnvironmental EngineeringEnvironmental RemediationChemisorptionBio-based SorbentChemistryAdsorptionMineral ProcessingNovel ResistWastewater Treatment

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