Japanese Journal of Applied Physics · 1990 · 19 citations · 8 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMicrofabricationPhotonicsMask DesignMask FabricationExposure Time DependenceOptical Absorption CoefficientOptical LithographyPhotolithographyPolymethyl MethacrylateResist PatterningResist SensitivitySubmicron Pattern Replication
The output properties of hydrogen light sources and the resist parameters, such as spectral sensitivity and absorption coefficient, in the vacuum-ultraviolet (VUV) region were investigated. A very low exposure energy of about 1 mJ/cm 2 was obtained by employing a very thin polymethyl methacrylate film and the VUV light of hydrogen microwave discharge. Contact photolithography using a Si/MgF 2 mask and a trilayer resist system showed that submicron patterns as small as 0.2 µm had been replicated at an exposure time of under 30 s.
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Burn J. Lin · Journal of Vacuum Science and Technology · 1975 · 159 citations
Optical absorption of some polymers in the region 240–170 nm
H. R. Philipp, H. S. Cole, Y. S. Liu et al. · Applied Physics Letters · 1986 · 84 citations
Natural Sciences, Materials Engineering, Materials Science +17