Diffusion of transition elements in GaAs and InP

M.R. Brozel, B. Tuck, E. J. Foulkes

Electronics Letters · 1981 · 19 citations · 2 references

Concepts

Abstract

A technique is presented for studying the diffusion of iron and chromium in GaAs and InP at temperatures down to 600°C. The technique is reproducible, and results are presented which show that in all four cases very fast diffusion occurs.

References

2