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Development of a stacked WCSP package platform using TSV (Through Silicon Via) technology
28
Citations
12
References
2012
Year
Unknown Venue
EngineeringIntegrated CircuitsPackage PlatformWafer Scale ProcessingAdvanced Packaging (Semiconductors)Heterogeneous IntegrationSystems EngineeringElectronic Packaging3D Ic ArchitectureElectrical EngineeringChip On BoardIntegration FlowComputer EngineeringChip AttachmentMicroelectronics3D PrintingAdvanced PackagingSilicon ViaChip-scale PackageThree-dimensional Heterogeneous IntegrationMicrofabricationStacked Wcsp Package3D Integration
To enable the miniaturization, electrical performance and heterogeneous functionality needs for emerging Analog applications, a stacked Wafer-level Chip Scale Package (WCSP) package platform has been developed using Through-Silicon Via (TSV) technology. This allows stacking of ICs, MEMS, passives and other components in the vertical direction onto active or passive TSV wafers, to create innovative System-in-Package (SiP) product solutions. Since Analog devices are small in size and cost is a key care about, a careful selection of the integration flow is required to achieve a low cost packaging solution. In this work, an integration flow for the stacked WCSP package is presented, along with development details for the Chip-on-Wafer (CoW) bonding and wafer overmolding unit processes. The test vehicle was 3mm × 3mm in size and used 25u diameter Cu TSVs in a 200mm diameter wafer. Interconnect reliability evaluations were done with different micro-bump Under Bump Metallurgy (UBM) and TSV tip surface finish metallization combinations. Wafer ovemolding development included warpage, saw and adhesion evaluations with multiple mold materials. A back-end assembly flow was established with a mass reflow bonding process and an overmold material with low CTE and intermediate T <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">g</sub> and modulus. Samples were prepared with mold-on-die and exposed die package structures. Excellent time-zero yields were obtained, with an average TSV micro-bump interconnect resistance of 25 mohms. Results and failures modes from preliminary reliability testing are included.
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