One-step lithography for various size patterns with a hybrid mask-mold

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

Engineering, Manufacturing Engineering, Materials Science +15

Imprint Lithography with 25-Nanometer Resolution

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Science · 1996 · 2.3K citations

Engineering, Electrical Engineering, Manufacturing Engineering +14

Sub-10 nm imprint lithography and applications

Stephen Y. Chou, Peter R. Krauss, Wei Zhang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 1.1K citations

Engineering, Electrical Engineering, Materials Science +14

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen C. Johnson, M. D. Stewart et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 564 citations

Engineering, Materials Engineering, Materials Science +16

Flow behaviour of thin polymer films used for hot embossing lithography

Laura J. Heyderman, Helmut Schift, Christian Dávid et al. · Microelectronic Engineering · 2000 · 351 citations

Natural Sciences, Materials Engineering, Materials Science +15