Capabilities of DLW for fabrication of planar waveguides in PDMS

Abstract

In this paper, capabilities of the fabrication technology for planar waveguide structures and devices in polydimethylsiloxane (PDMS) are presented. Direct laser writing in combination with imprinting technique was used to pattern photoresist layer as a master for imprinting process. In the next step, PDMS waveguide structures as channel waveguide, Y-branch waveguide splitter and ring resonator were imprinted. Finally, optical and morphological properties of prepared devices were investigated by confocal microscopy and atomic force microscopy.