Publication | Closed Access
Interstitial trapping efficiency of C+ implanted into preamorphised silicon — control of EOR defects
24
Citations
12
References
1997
Year
Materials ScienceIon ImplantationEngineeringCrystalline DefectsStress-induced Leakage CurrentApplied PhysicsEor DefectsSemiconductor Device FabricationSilicon On InsulatorMicroelectronics
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