Publication | Closed Access
Atomic layer deposition of Al2O3, ZrO2, Ta2O5, and Nb2O5 based nanolayered dielectrics
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Citations
14
References
2002
Year
Materials ScienceMaterials EngineeringEngineeringNanotechnologyOxide ElectronicsApplied PhysicsChemical DepositionNanolayered DielectricsChemical Vapor DepositionAtomic Layer DepositionThin Film Processing
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