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Single-electron transistors operating at room temperature, fabricated utilizing nanocrystals created by focused-ion beam
75
Citations
15
References
2002
Year
EngineeringElectron-beam LithographySingle-electron TransistorsSemiconductor DeviceFib TechniqueSemiconductor NanostructuresNanoelectronicsIon BeamMaterials ScienceElectrical EngineeringPhysicsNanotechnologySingle-electron TransistorMicroelectronicsRoom TemperatureUtilizing NanocrystalsApplied PhysicsSemiconductor MemoryOptoelectronics
A focused-ion-beam (FIB) technique utilizing both lithographic and nanoparticle formation processes has been introduced to fabricate a single-electron transistor (SET) that can operate at room temperature. The results for the drain current as a function of the gate voltage at different source voltages at room temperature clearly show Coulomb oscillations indicative of Coulomb-blockade effects. These results indicate that SETs operating at room temperature, fabricated utilizing the FIB technique, hold promise for potential applications in ultra-high-density memory devices.
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