Journal of Applied Physics · 2008 · 27 citations · 22 references
Two-dimensional Junction IdentificationEngineeringMicroscopyPhotovoltaicsSemiconductor NanostructuresSemiconductorsElectronic DevicesNanoelectronicsElectric FieldNanometrologyNanoscale ScienceElectrical EngineeringPhysicsCrystalline DefectsJunction DepthSemiconductor MaterialScanning Probe MicroscopyApplied PhysicsScanning Force MicroscopySkpfm Potential MeasurementDevice CharacterizationSolar Cell Materials
We report on a two-dimensional investigation of the p-n junction in multicrystalline silicon solar cells using scanning Kelvin probe force microscopy (SKPFM). The junction location and depth were identified by SKPFM potential measurement and subsequent data analysis, where a procedure taking bias-voltage-induced changes in the potential and electric field was developed to avoid the effects of surface Fermi level pinning. Device simulation supported the junction identification procedure and showed a possible deviation of ∼40 nm in the junction identification. The two-dimensional electric-field images show that the shape of the junction follows the surface topography of the device, or, in other words, the junction depth is identical over the device.
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Local built-in potential on grain boundary of Cu(In,Ga)Se2 thin films
Chun‐Sheng Jiang, R. Noufi, J. AbuShama et al. · Applied Physics Letters · 2004 · 198 citations · Full text