SrHfO3 as gate dielectric for future CMOS technology

C. Rossel, M. Sousa, Chiara Marchiori, J. Fompeyrine, D. J. Webb, Daniele Caimi, B. Mereu, Adriana Ispas, Jean‐Pierre Locquet, H. Siegwart,

Microelectronic Engineering · 2007 · 70 citations · 8 references

DOIFull text

Open access

Concepts

References

8