Production of High-Density Plasmas in Electron-Beam-Excited Plasma Device

Abstract

We tried to enlarge the diameter of high-density beam plasmas in an electron-beam-excited plasma (EBEP) device. In order to enlarge the beam plasma, we made a cusp configuration at the end of the ion source region in the EBEP device. Also, a surface confined ring with permanent magnets called “surmac” was mounted on the cusp center to make the plasma profiles flat. It was found that high electron density (7×10 11 cm -3 ) and uniformity (Δ N e / N e <4% over 6 cmφ) could be obtained at low pressure (7×10 -4 Torr).