A 45nm Low-Standby-Power Embedded SRAM with Improved Immunity Against Process and Temperature Variations

Makoto Yabuuchi, Koji Nii, Yasumasa Tsukamoto, S. Ohbayashi, Susumu Imaoka, Hiroshi Makino, Y. Yamagami, Satoshi Ishikura, T. Terano, T. Oashi,

2007 · 66 citations · 7 references

Concepts

Abstract

A 512kb SRAM module is implemented in a 45nm low-standby-power CMOS with variation-tolerant assist circuits against process and temperature. A passive resistance is introduced to the read assist circuit and a divided V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DD</sub> line is adopted in the memory array to assist the write. Two SRAM cells with areas of 0.245mum <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and 0.327mum <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> are fabricated. Measurements show that the SNM exceeds 120mV and the write margin improves by 15% in the worst PVT condition.

References

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