Journal of Applied Physics · 1973 · 75 citations · 16 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsLaser PhysicsOptical Properties Of SemiconductorsOptical SourcesOptical WaveguidesSemiconductor HeterostructuresSemiconductor LasersBeam DivergenceCompositionDivergenceDouble Heterostructure DevicesDouble HeterostructuresHeterostructure DevicesHeterostructure LasersWaveguide Lasers
Far-field emission patterns of GaAs–AlxGa1-xAs double-heterostructure lasers have been measured to determine the dependence of the beam divergence as a function of active layer thickness d and composition x. The beam divergence in the plane of the junction θ∥ is ∼ 10°, while the beam divergence perpendicular to the junction plane θ⊥ is considerably larger and depends strongly on d and x. Curves are given for θ⊥ and the confinement factor Γ as a function of d between 0.05 and 2.0 μ for x = 0.1, 0.2, 0.3, and 0.4. These curves were calculated by considering the laser as a dielectric waveguide with a refractive index step between GaAs and AlxGa1−xAs.
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D. T. F. Marple · Journal of Applied Physics · 1964 · 332 citations
Natural Sciences, Electrical Engineering, Materials Science +16
R. E. Fern, A. Onton · Journal of Applied Physics · 1971 · 182 citations
Optical waveguides in GaAs–AlGaAs epitaxial layers
R. A. Logan, F. K. Reinhart · Journal of Applied Physics · 1973 · 167 citations