Publication | Closed Access
Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films
32
Citations
37
References
2005
Year
Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied PhysicsThin FilmsAtomic Layer DepositionChemical DepositionChemical Vapor DepositionCarrier Gas PressureZro2 Thin FilmsThin Film Processing
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