Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films

Kristel Möls, Lauri Aarik, Hugo Mändar, +4

Optical Materials

Materials ScienceOptical MaterialsEngineeringOptical PropertiesOxide Electronics +5

Electrochemical reduction of oxygen on thin-film Pt electrodes in acid solutions

Ave Sarapuu, Aarne Kasikov, Timo Laaksonen, +2

Electrochimica Acta

Materials ScienceAcid SolutionsEngineeringElectrochemical ReductionSurface Electrochemistry +6

Smooth polymers charge negatively: Controlling contact electrification polarity in polymers

Osvalds Verners, Linards Lapčinskis, Līva Ģērmane, +6

Nano Energy

Materials ScienceSmooth PolymersElectroactive MaterialConducting PolymerEngineering +4

Oxygen reduction on Nafion-coated thin-film palladium electrodes

Heiki Erikson, Aarne Kasikov, Christoffer Johans, +3

Journal of Electroanalytical Chemistry

Materials ScienceEngineeringSurface ElectrochemistryOxygen ReductionThin Films +2

Electroreduction of oxygen on gold-supported nanostructured palladium films in acid solutions

Ave Sarapuu, Aarne Kasikov, Naomi Wong, +4

Electrochimica Acta

Materials ScienceOxygen Reduction ReactionAcid SolutionsEngineeringNanomaterials +5

Composition and thickness determination of thin oxide films: comparison of different programs and methods

Väino Sammelselg, Jaan Aarik, A. Aidla, +4

Journal of Analytical Atomic Spectrometry

EngineeringThin Film Process TechnologyThickness DeterminationChemical DepositionMass Thickness +17

Refractive index gradients in TiO₂thin films grown by atomic layer deposition

Aarne Kasikov, Jaan Aarik, Hugo Mändar, +3

Journal of Physics D Applied Physics

Materials ScienceEpitaxial GrowthEngineeringPhysicsOptical Properties +13

Oxygen reduction reaction on thin-film Ag electrodes in alkaline solution

Jonas Mart Linge, Heiki Erikson, Aarne Kasikov, +3

Electrochimica Acta

Materials ScienceOxygen Reduction ReactionEngineeringSurface ElectrochemistrySurface Science +5

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Jaan Aarik, Aleks Aidla, Aarne Kasikov, +3

Applied Surface Science

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics +7

Impact of plasma treatment on electrical properties of TiO₂/RuO₂based DRAM capacitor

Boris Hudec, K. Hušeková, A. Rosová, +8

Journal of Physics D Applied Physics

Materials ScienceElectrical EngineeringEngineeringElectrode-electrolyte InterfaceTio2/ruo2 Interface +12