Applied Physics Letters · 2002 · 48 citations · 7 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsOptical MaterialsOpticsChemical Vapor DepositionOptical Thin FilmsOptical WaveguidesSemiconductor HeterostructuresThin Film Optical PropertiesWaveguidesOptical Loss MechanismsOptical LossesPlanar Optical WaveguidesPlanar WaveguidesPlasma-assisted Chemical Vapor DepositionPlasma-enhanced Chemical Vapor DepositionPlasma-enhanced DepositionWaveguide Loss
A double frequency overtone of the fundamental N–H bond related vibration was found to dominate the optical loss in the 1.5–1.6 μm range in high index GeSiON-based planar waveguides deposited by plasma-enhanced chemical vapor deposition using hydrogen-based precursors. The fundamental N–H bond-related absorption and its double frequency overtone were measured to be ∼560 cm−1 and 1.8 cm−1, respectively, resulting in their ratio of 310±10. The optical loss, extracted from analysis of the N–H-related absorption is consistent with the directly measured optical loss in the waveguide structures. It was shown that using the deuterated precursors results in incorporation of N–D bonds in the GeSiON films. The N–H bond absorption band was eliminated in the deuterated films, leading to low optical losses in the communication band.
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Annealing of plasma silicon oxynitride films
C. M. M. Denisse, Kars Troost, F.H.P.M. Habraken et al. · Journal of Applied Physics · 1986 · 74 citations
Natural Sciences, Materials Engineering, Materials Science +17
Torben Storgaard‐Larsen, Otto Leistiko · Journal of The Electrochemical Society · 1997 · 35 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17