IEEE Electron Device Letters · 2014 · 10 citations · 13 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportComplementary Metal-oxide-semiconductor TechnologyHigh-frequency Semiconductor DevicesMetal-oxide-semiconductor Field-effect TransistorsRadio-frequency Integrated CircuitsSemiconductor Device MaterialsBody EffectCutoff FrequencyFully Depleted Silicon-on-insulator ScalingFully Depleted Silicon-on-insulator TransistorsSilicon-on-insulator Technology
Radio-frequency (RF) performance of multi-finger partially depleted silicon-on-insulator (SoI) nMOSFETs with tunnel diode body contact (TDBC) structure is investigated in this letter. The TDBC structure suppresses floating-body effect and body instability significantly and shows less drain conductance degradation with respect to FB and TB devices. The peak cutoff frequency (fT) and maximum oscillation frequency (fMAX) of TDBC devices are 96.4 and 132.8 GHz, respectively. Due to lower parasitic resistances and capacitances, the device with TDBC structures represents an improvement of 10% for the fT and of 90% for the fMAX compared with conventional T-gate body-contact devices. The investigation results indicate that TDBC SoI MOSFETs are a good candidate for analog and RF applications.
13