Applied Physics Letters · 1991 · 28 citations · 7 references
Natural SciencesMaterials SciencePhysicsCeramic MaterialsCondensed Matter PhysicsThin FilmsMagnetic OxidesMagnetic Properties Of SolidsOxide SemiconductorsThin Film Electrical PropertiesThin-film MaterialsChannelingCritical Current DensityCritical Current PerformanceMagnetron SputteringSapphire Substrate PreparationThin Oxide FilmsYttrium Aluminum Garnet CeramicsYttrium Barium Copper Oxide Films
Epitaxial, c-oriented YBa2Cu3Ox thin films were deposited by dc sputtering on (11̄02)-sapphire substrates with an intermediate buffer layer of Y-stabilized ZrO2 (YSZ), which was grown by rf magnetron sputtering. The epitaxy of the YSZ and the YBa2Cu3Ox films was proved by Rutherford backscattering spectrometry combined with ion channeling. The YBa2Cu3Ox films exhibited transition temperatures of 90 K and had critical current densities exceeding 1.2×106 A/cm2 at 77 K in zero magnetic field.
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Characterization of polycrystalline layers by channelling measurements
D. Sigurd, R.W. Bower, W. F. van der Weg et al. · Thin Solid Films · 1973 · 65 citations
Natural Sciences, Materials Engineering, Materials Science +12
Reaction patterning of YBa2Cu3O7−δ thin films on Si
D. K. Fork, A. Barrera, T. H. Geballe et al. · Applied Physics Letters · 1990 · 51 citations