Publication | Closed Access
Small geometry effects in n- and p-channel polysilicon thin film transistors
18
Citations
2
References
2003
Year
Unknown Venue
Electrical EngineeringEngineeringVlsi DesignHigh-speed ElectronicsMicrofabricationP-channel Polysilicon TftsApplied PhysicsSmall Geometry EffectsSemiconductor Device FabricationIntegrated CircuitsShift RegistersSilicon On InsulatorMicroelectronicsBeyond CmosThin Film TransistorsSemiconductor Device
The authors describe the results of an experimental study of small-geometry effects in n- and p-channel polysilicon TFTs (thin film transistors) fabricated on quartz substrates. Short-channel effects are shown to be severe, with significant threshold shifts observed in devices with gate lengths of less than about 8 mu m and degradation in drain breakdown voltages for gate lengths below about 5 mu m. The performance of simple digital CMOS circuits fabricated using TFTs with a range of gate lengths is also reported, and the improvement in speed achieved by reducing gate lengths is shown. In particular, the operation of shift registers, designed using 5- mu m-long TFTs at clock frequencies in excess of 50 MHz, is demonstrated.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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