Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Abstract

We have demonstrated the synthesis and morphology chracterization of fluorine-containing PMAPOSS based block copolymers, PMAPOSS-b-PTFEMAs. The resulting block copolymers show the formation of lamellar structures in a bulk. Upon thermal annealing, the vertical oriented lamellar structures are formed by the surface segregation and microphase separation in the thin films on a variety of substrates. Very short annealing time only for one minute under an air atmosphere is also benefit for manufcturing processes. The excellent self-assembling characetristics, good etch selectivity between the blocks, and vertical orientation ability of lamellar structures make the PMAPOSS-b-PTFEMAs an ideal candidate for block copolymer lithography.