Throughput Improvement

Throughput Improvement is a methodological advancement in electron beam lithography that enhances the rate of pattern generation per unit time by optimizing beam scanning strategies, exposure parameters, or resist processing techniques to increase fabrication efficiency.

2K

Publications

99.3K

Citations

7K

Authors

1.5K

Institutions

Publications per year

2017–2026

513

Authors

7K

  1. SC
    Sunghyun Choi

    Seoul National University, South Korea

    8 publications · 242 citations

    8

    h-index

  2. HC
    H. C. Pfeiffer

    IBM (United States), United States

    7 publications · 187 citations

    7

    h-index

  3. PK
    Pramod Kumar Meher

    Nanyang Technological University, Singapore

    7 publications · 325 citations

    7

    h-index

  4. SK
    Sachin Katti

    Stanford University, United States

    6 publications · 1.8K citations

    6

    h-index

  5. HH
    Hiroshi Harada

    National Institute for Materials Science, Japan

    6 publications · 176 citations

    6

    h-index

1–5 of 7K

Venues

  1. IEEE Transactions on Vehicular Technology

    45 publications · 2K citations

    25

    h-index

  2. IEEE Transactions on Wireless Communications

    37 publications · 1.8K citations

    23

    h-index

  3. 22

    h-index

  4. IEEE Transactions on Communications

    35 publications · 1.7K citations

    20

    h-index

  5. IEEE Communications Letters

    28 publications · 996 citations

    19

    h-index

1–5