Throughput Improvement
Throughput Improvement is a methodological advancement in electron beam lithography that enhances the rate of pattern generation per unit time by optimizing beam scanning strategies, exposure parameters, or resist processing techniques to increase fabrication efficiency.
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Publications
99.3K
Citations
7K
Authors
1.5K
Institutions
Publications per year
2017–2026
513
Parents
2K
A high-throughput path metric for multi-hop wireless routing
Douglas S. J. De Couto, Daniel Aguayo, John Bicket et al. · 2003 · 3.4K citations
Dejian Huang, Boxin Ou, Maureen Hampsch‐Woodill et al. · Journal of Agricultural and Food Chemistry · 2002 · 1.6K citations
Embracing wireless interference
Sachin Katti, Shyamnath Gollakota, Dina Katabi · 2007 · 1.3K citations · Full text
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Stanford University
Stanford, United States
21 h-index
78 publications
3.5K citations
Massachusetts Institute of Technology
Cambridge, United States
20 h-index
58 publications
21.5K citations
Tsinghua University
Beijing, China
20 h-index
87 publications
2.9K citations
University of California, Berkeley
Berkeley, United States
18 h-index
86 publications
7.5K citations
Nanyang Technological University
Singapore, Singapore
17 h-index
44 publications
1.4K citations
University of Southern California
Los Angeles, United States
17 h-index
47 publications
2.1K citations

University of Waterloo
Waterloo, Canada
17 h-index
48 publications
3.5K citations
AT&T (United States)
Bedminster, United States
17 h-index
67 publications
3.6K citations
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45 publications · 2K citations
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37 publications · 1.8K citations
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66 publications · 1.6K citations
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35 publications · 1.7K citations
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28 publications · 996 citations
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