Concepedia

Surface Coverage Modeling

Surface Coverage Modeling is a computational framework that characterizes the extent and distribution of material deposition on a substrate during robotic coating processes by integrating path planning, application parameters, and surface geometry to predict coating uniformity and completeness.

149

Publications

6.7K

Citations

482

Authors

195

Institutions

Publications per year

2017–2026

28

Parents

Publications

149

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

Roy G. Gordon, Dennis M. Hausmann, E. Kim et al. · Chemical Vapor Deposition · 2003 · 390 citations · Full text

, , +17

Superconformal film growth: Mechanism and quantification

T. P. Moffat, Daniel Wheeler, Monica D. Edelstein et al. · IBM Journal of Research and Development · 2005 · 371 citations

, , +17

Superconformal Electrodeposition of Copper

Thomas P. Moffat, Daniel Wheeler, William Huber et al. · Electrochemical and Solid-State Letters · 2001 · 325 citations

, , +17

Anomalous Codeposition of Iron Group Metals: II. Mathematical Model

N. Zech, Elizabeth J. Podlaha, D. Landolt · Journal of The Electrochemical Society · 1999 · 146 citations

, , +15

Nature of  CO  Adsorption during  H 2 Oxidation in Relation to Modeling for  CO  Poisoning of a Fuel Cell Anode

H. P. Dhar, L. Christner, A. Kush · Journal of The Electrochemical Society · 1987 · 146 citations

, , +17

1–5 of 149

Authors

482

  1. DW
    Daniel Wheeler

    National Institute of Standards and Technology, United States

    5 publications · 855 citations

    5

    h-index

  2. DJ
    D. Josell

    National Institute of Standards and Technology, United States

    4 publications · 839 citations

    4

    h-index

  3. TP
    Thomas P. Moffat

    National Institute of Standards and Technology, United States

    3 publications · 468 citations

    3

    h-index

  4. MJ
    Michael J. Brett

    University of Alberta, Canada

    3 publications · 96 citations

    3

    h-index

  5. TS
    T. Smy

    Carleton University, Canada

    3 publications · 96 citations

    3

    h-index

1–5 of 482

Institutions

195

  1. Shanghai Jiao Tong University

    Shanghai, China

    4 h-index

    19 publications

    1K citations

  2. National Institute of Standards and Technology

    Gaithersburg, United States

    4 h-index

    13 publications

    2.5K citations

  3. University of Alberta

    Edmonton, Canada

    3 h-index

    8 publications

    242 citations

  4. École Polytechnique Fédérale de Lausanne

    Lausanne, Switzerland

    3 h-index

    7 publications

    652 citations

  5. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    10 publications

    189 citations

  6. University of Illinois Urbana-Champaign

    Urbana, United States

    3 h-index

    8 publications

    195 citations

  7. Korea Advanced Institute of Science and Technology

    Daejeon, South Korea

    3 h-index

    12 publications

    466 citations

  8. Stanford University

    Stanford, United States

    2 h-index

    7 publications

    492 citations

1–8 of 195

Venues

  1. Journal of The Electrochemical Society

    JES · 12 publications · 694 citations

    12

    h-index

  2. Journal of Applied Physics

    8 publications · 454 citations

    8

    h-index

  3. 6

    h-index

  4. The Journal of Physical Chemistry C

    6 publications · 265 citations

    6

    h-index

  5. Langmuir

    5 publications · 224 citations

    5

    h-index

1–5