Concepedia

Plasma Uniformity

Plasma Uniformity is a plasma characteristic metric that quantifies the spatial consistency of plasma parameters such as density, temperature, and electric potential across a given volume, distinguishing it from other plasma diagnostics by its focus on homogeneity as a critical factor for process reproducibility and efficiency in plasma-based applications.

185

Publications

6.1K

Citations

658

Authors

205

Institutions

Publications per year

2017–2026

26

Parents

Publications

185

Standing wave and skin effects in large-area, high-frequency capacitive discharges

M. A. Lieberman, Jean‐Paul Booth, Pascal Chabert et al. · Plasma Sources Science and Technology · 2002 · 359 citations

, , +17

Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition

A.A. Howling, J.-L. Dorier, Ch. Hollenstein et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 169 citations · Full text

, , +15

Powerful relativistic electron beams in a plasma and in a vacuum (theory)

B. N. Brejzman, D. D. Ryutov · Nuclear Fusion · 1974 · 166 citations · Full text

, , +16

The High Frequency Behavior of a Plasma

Lewi Tonks · Physical Review · 1931 · 162 citations

, , +10

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

Harald Schmidt, L. Sansonnens, A.A. Howling et al. · Journal of Applied Physics · 2004 · 146 citations · Full text

, , +12

1–5 of 185

Authors

658

  1. SR
    Shahid Rauf

    Applied Materials (United States), United States

    8 publications · 220 citations

    8

    h-index

  2. YW
    You‐Nian Wang

    Dalian University of Technology, China

    8 publications · 179 citations

    8

    h-index

  3. YZ
    Yu‐Ru Zhang

    Dalian University of Technology, China

    6 publications · 128 citations

    6

    h-index

  4. YL
    Yong-Xin Liu

    Dalian University of Technology, China

    5 publications · 111 citations

    5

    h-index

  5. DB
    David B. Graves

    University of California, Berkeley, United States

    5 publications · 416 citations

    5

    h-index

1–5 of 658

Institutions

205

  1. Dalian University of Technology

    Dalian, China

    13 h-index

    59 publications

    1.3K citations

  2. Applied Materials (United States)

    Santa Clara, United States

    11 h-index

    45 publications

    1.3K citations

  3. University of California, Berkeley

    Berkeley, United States

    8 h-index

    27 publications

    2K citations

  4. Ruhr University Bochum

    Bochum, Germany

    7 h-index

    26 publications

    883 citations

  5. Sungkyunkwan University

    Seoul, South Korea

    7 h-index

    31 publications

    592 citations

  6. Centre National de la Recherche Scientifique

    Paris, France

    6 h-index

    17 publications

    430 citations

  7. Samsung (South Korea)

    Seoul, South Korea

    5 h-index

    20 publications

    447 citations

  8. Hanyang University

    Seoul, South Korea

    5 h-index

    16 publications

    394 citations

1–8 of 205

Venues

  1. Plasma Sources Science and Technology

    24 publications · 1.2K citations

    18

    h-index

  2. 16

    h-index

  3. Review of Scientific Instruments

    14 publications · 340 citations

    13

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 16 publications · 343 citations

    12

    h-index

  5. Applied Physics Letters

    13 publications · 462 citations

    12

    h-index

1–5