Concepedia

Photomask Writing

Photomask Writing is a precision lithographic process in semiconductor manufacturing that belongs to the class of photomask fabrication techniques, distinguished by its direct patterning of integrated circuit designs onto a photomask substrate using electron beam or laser beam exposure systems to transfer nanoscale features with sub-wavelength accuracy.

26

Publications

755

Citations

157

Authors

38

Institutions

Publications per year

2017–2026

2

Parents

Publications

26

Prototyping of Masks, Masters, and Stamps/Molds for Soft Lithography Using an Office Printer and Photographic Reduction

Tao Deng, Hongkai Wu, Scott Brittain et al. · Analytical Chemistry · 2000 · 126 citations

, , +17

Inverse Lithography Technology (ILT): what is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 82 citations

, , +13

Grayscale photomask fabricated by laser direct writing in metallic nano-films

Chuan Fei Guo, Sihai Cao, Peng Jiang et al. · Optics Express · 2009 · 61 citations · Full text

, , +14

Laser writing techniques for photomask fabrication using a femtosecond laser

Krishnan Venkatakrishnan, B. K. A. Ngoi, P. Stanley et al. · Applied Physics A · 2002 · 60 citations

, , +14

Patterning Organic/Inorganic Hybrid Bragg Stacks by Integrating One-Dimensional Photonic Crystals and Macrocavities through Photolithography: Toward Tunable Colorful Patterns as Highly Selective Sensors

Zhanhua Wang, Junhu Zhang, Jing Xie et al. · ACS Applied Materials & Interfaces · 2012 · 47 citations

, , +17

1–5 of 26

Authors

157

  1. GH
    Glenn H. Chapman

    Simon Fraser University, Canada

    3 publications · 45 citations

    3

    h-index

  2. JM
    James M. Dykes

    Simon Fraser University, Canada

    2 publications · 32 citations

    2

    h-index

  3. TH
    Takaaki Hiraka

    Dai Nippon Printing (Japan), Japan

    2 publications · 22 citations

    2

    h-index

  4. YM
    Yasutaka Morikawa

    Dai Nippon Printing (Japan), Japan

    2 publications · 22 citations

    2

    h-index

  5. SS
    Shiho Sasaki

    Dai Nippon Printing (Japan), Japan

    2 publications · 22 citations

    2

    h-index

1–5 of 157

Institutions

38

  1. Simon Fraser University

    Burnaby, Canada

    3 h-index

    13 publications

    184 citations

  2. Toshiba (Japan)

    Tokyo, Japan

    2 h-index

    14 publications

    212 citations

  3. Luminex (United States)

    Austin, United States

    2 h-index

    5 publications

    266 citations

  4. Dai Nippon Printing (Japan)

    Tokyo, Japan

    2 h-index

    16 publications

    176 citations

  5. Chinese Academy of Sciences

    Beijing, China

    2 h-index

    3 publications

    109 citations

  6. Photronics (United States)

    Brookfield, United States

    1 h-index

    4 publications

    40 citations

  7. National Center for Nanoscience and Technology

    Beijing, China

    1 h-index

    9 publications

    549 citations

  8. Peking University

    Beijing, China

    1 h-index

    4 publications

    100 citations

1–8 of 38

Venues

  1. 10

    h-index

  2. ACS Applied Materials & Interfaces

    2 publications · 72 citations

    2

    h-index

  3. Journal of Microscopy

    1 publications · 30 citations

    1

    h-index

  4. IBM Journal of Research and Development

    1 publications · 40 citations

    1

    h-index

  5. 1

    h-index

1–5