Photomask Design is a specialized methodology in semiconductor manufacturing that defines the precise geometric patterns transferred onto photomasks to enable the accurate replication of integrated circuit layouts during photolithography.
146
Publications
4.6K
Citations
615
Authors
145
Institutions
Publications per year
2017–2026
12
Parents
Publications
146
Photocatalytic Patterning and Modification of Graphene
Liming Zhang, Shuo Diao, Yufeng Nie et al. · Journal of the American Chemical Society · 2011 · 176 citations
Natural Sciences, Materials Engineering, Materials Science +15
1–5 of 146
Authors
615
- LP
5
h-index
- EY
4
h-index
- HL
3
h-index
- HR
3
h-index
- DA
3
h-index
1–5 of 615
Institutions
145
Nanyang Technological University
Singapore, Singapore
6 h-index
18 publications
664 citations
Luminex (United States)
Austin, United States
6 h-index
23 publications
857 citations
Carl Zeiss (Germany)
Oberkochen, Germany
4 h-index
19 publications
286 citations
GlobalFoundries (United States)
Santa Clara, United States
4 h-index
10 publications
148 citations
Kyushu University
Fukuoka, Japan
3 h-index
10 publications
171 citations
Photronics (United States)
Brookfield, United States
3 h-index
8 publications
80 citations
University of Central Florida
Orlando, United States
3 h-index
9 publications
524 citations
Advanced Mask Technology Center (Germany)
Dresden, Germany
3 h-index
5 publications
99 citations
1–8 of 145
Venues
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
31 publications · 682 citations
16
h-index
- Optics Express
9 publications · 461 citations
9
h-index
- Advanced Materials
6 publications · 336 citations
6
h-index
- Applied Physics Letters
5 publications · 343 citations
5
h-index
- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
5 publications · 219 citations
5
h-index
1–5