Metal Contact Optimization is a methodological framework in semiconductor device engineering that systematically refines the physical and electrical properties of metal-semiconductor interfaces to minimize contact resistance and maximize carrier injection efficiency.
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Doping-free complementary WSe2 circuit via van der Waals metal integration
Lingan Kong, Xiaodong Zhang, Quanyang Tao et al. · Nature Communications · 2020 · 272 citations · Full text
A. C. Schmitz, A. T. Ping, M. Asif Khan et al. · Journal of Electronic Materials · 1998 · 189 citations
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IMEC
Leuven, Belgium
7 h-index
134 publications
3.2K citations
UNSW Sydney
Sydney, Australia
5 h-index
13 publications
215 citations
National Laboratory of the Rockies
Golden, United States
3 h-index
15 publications
285 citations
KU Leuven
Leuven, Belgium
3 h-index
10 publications
544 citations
Fraunhofer Institute for Solar Energy Systems
Freiburg im Breisgau, Germany
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16 publications
1.1K citations
University of California, Los Angeles
Los Angeles, United States
2 h-index
2 publications
299 citations
University of Illinois Urbana-Champaign
Urbana, United States
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654 citations
National Taiwan University
Taipei, Taiwan
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65 citations
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6 publications · 173 citations
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6 publications · 218 citations
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- Progress in Photovoltaics Research and Applications
4 publications · 189 citations
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- Journal of Applied Physics
3 publications · 123 citations
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