Thickness-dependent Schottky barrier height of MoS₂field-effect transistors

Abstract

2D semiconductors, including transition metal dichalcogenides (TMDs), have been widely studied recently. However, the device performance is deteriorated due to the significant contact resistance. The contact resistance of MoS₂-metal contacts decreases with the thickness of MoS₂. We obtained a Schottky barrier height as low as about 70 meV when MoS₂ is trilayer-thick. It is important to find the optimal choice of contact metal and layer thickness of MoS₂.