Inverse Lithography Technology is a computational lithography method that synthesizes mask patterns by mathematically inverting the photolithographic imaging process to achieve higher pattern fidelity in semiconductor manufacturing.
111
Publications
3.3K
Citations
404
Authors
93
Institutions
Publications per year
2017–2026
24
Parents
Publications
111
1–5 of 111
Authors
404
- LP
13
h-index
- EY
10
h-index
- GR
7
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- XM
7
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- GX
7
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1–5 of 404
Institutions
93
Luminex (United States)
Austin, United States
13 h-index
111 publications
3K citations
University of Hong Kong
Pok Fu Lam, Hong Kong
10 h-index
34 publications
1.7K citations
University of Delaware
Newark, United States
6 h-index
8 publications
275 citations
Mentor Technologies
Tulsa, United States
6 h-index
20 publications
357 citations
The University of Texas at Austin
Austin, United States
5 h-index
11 publications
264 citations
Beijing Institute of Technology
Beijing, China
4 h-index
13 publications
386 citations
Chinese University of Hong Kong
Hong Kong, Hong Kong
4 h-index
19 publications
650 citations
University of California, Santa Cruz
Santa Cruz, United States
4 h-index
7 publications
221 citations
1–8 of 93
Venues
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
39 publications · 934 citations
17
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- Optics Express
10 publications · 401 citations
10
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- Microelectronic Engineering
6 publications · 226 citations
6
h-index
- Journal of Micro/Nanolithography MEMS and MOEMS
5 publications · 199 citations
5
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- Journal of the Optical Society of America A
3 publications · 96 citations
3
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1–5