Interferometric Metrology

Interferometric Metrology is a dimensional measurement methodology that employs the interference of coherent light waves to achieve nanometer-level precision in the assessment of surface form, topography, and physical quantities by converting optical path differences into measurable interference fringe patterns.

1.9K

Publications

74.7K

Citations

4.2K

Authors

986

Institutions

Publications per year

2017–2026

223

Authors

4.2K

  1. JC
    James C. Wyant

    University of Arizona, United States

    22 publications · 2.3K citations

    18

    h-index

  2. PJ
    Peter J. de Groot

    Zygo (United States), United States

    21 publications · 2K citations

    17

    h-index

  3. KH
    Kenichi Hibino

    National Institute of Advanced Industrial Science and Technology, Japan

    18 publications · 563 citations

    15

    h-index

  4. PH
    P. Hariharan

    Commonwealth Scientific and Industrial Research Organisation, Australia

    16 publications · 1.4K citations

    15

    h-index

  5. YK
    Yangjin Kim

    The University of Tokyo, Japan

    15 publications · 373 citations

    14

    h-index

1–5 of 4.2K

Venues

  1. Applied Optics

    349 publications · 17K citations

    62

    h-index

  2. Optics Letters

    91 publications · 5K citations

    41

    h-index

  3. Optics Express

    121 publications · 4.6K citations

    35

    h-index

  4. Optics and Lasers in Engineering

    90 publications · 4.5K citations

    31

    h-index

  5. Measurement Science and Technology

    74 publications · 2.5K citations

    27

    h-index

1–5