Interfacial Oxide Formation

Interfacial Oxide Formation is a surface oxidation phenomenon characterized by the development of an oxide layer at the boundary between two distinct materials or phases, distinguished by its dependence on interfacial atomic structure, chemical potential gradients, and localized redox reactions that govern nucleation and growth kinetics.

279

Publications

12.2K

Citations

1.3K

Authors

368

Institutions

Publications per year

2017–2026

58

Authors

1.3K

  1. GK
    Goutam Kumar Dalapati

    Institute of Materials Research and Engineering, Singapore

    6 publications · 210 citations

    6

    h-index

  2. RM
    Robert M. Wallace

    The University of Texas at Dallas, United States

    5 publications · 290 citations

    5

    h-index

  3. YJ
    Yves J. Chabal

    The University of Texas at Dallas, United States

    4 publications · 97 citations

    4

    h-index

  4. MM
    Marko Milojević

    The University of Texas at Dallas, United States

    4 publications · 275 citations

    4

    h-index

  5. PA
    P. Ashburn

    University of Southampton, United Kingdom

    3 publications · 293 citations

    3

    h-index

1–5 of 1.3K

Venues

  1. Applied Physics Letters

    34 publications · 1.6K citations

    26

    h-index

  2. Journal of Applied Physics

    23 publications · 1.2K citations

    18

    h-index

  3. Journal of The Electrochemical Society

    JES · 16 publications · 438 citations

    13

    h-index

  4. Surface Science

    11 publications · 449 citations

    11

    h-index

  5. Applied Surface Science

    10 publications · 436 citations

    10

    h-index

1–5