Homoepitaxy

Homoepitaxy is a semiconductor crystal growth technique in which a crystalline film is deposited on a substrate of the same material, ensuring lattice matching and minimizing interfacial defects.

212

Publications

9.4K

Citations

914

Authors

271

Institutions

Publications per year

2017–2026

30

Variants

Homoepitaxial Growth

Authors

914

  1. JW
    James W. Evans

    Iowa State University, United States

    6 publications · 319 citations

    6

    h-index

  2. MC
    M. C. Bartelt

    Iowa State University, United States

    5 publications · 321 citations

    5

    h-index

  3. PA
    P. A. Thiel

    Iowa State University, United States

    5 publications · 167 citations

    5

    h-index

  4. PŠ
    Pavel Šmilauer

    Imperial College London, United Kingdom

    5 publications · 217 citations

    5

    h-index

  5. HO
    Hideyo Okushi

    National Institute of Advanced Industrial Science and Technology, Japan

    5 publications · 292 citations

    5

    h-index

1–5 of 914

Venues

  1. Applied Physics Letters

    29 publications · 1.9K citations

    22

    h-index

  2. Journal of Crystal Growth

    26 publications · 904 citations

    19

    h-index

  3. Diamond and Related Materials

    19 publications · 654 citations

    15

    h-index

  4. Surface Science

    16 publications · 612 citations

    13

    h-index

  5. Physical Review Letters

    PRL · 10 publications · 699 citations

    10

    h-index

1–5