Homoepitaxy
Homoepitaxy is a semiconductor crystal growth technique in which a crystalline film is deposited on a substrate of the same material, ensuring lattice matching and minimizing interfacial defects.
212
Publications
9.4K
Citations
914
Authors
271
Institutions
Publications per year
2017–2026
30
Variants
Homoepitaxial Growth
Parents
212
Lattice match: An application to heteroepitaxy
A. Zur, T. C. McGill · Journal of Applied Physics · 1984 · 388 citations
1–5 of 212
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National Institute of Advanced Industrial Science and Technology, Japan
5 publications · 292 citations
5
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1–5 of 914
271
Iowa State University
Ames, United States
11 h-index
11 publications
565 citations

Ames National Laboratory
Ames, United States
9 h-index
9 publications
505 citations
Forschungszentrum Jülich
Jülich, Germany
7 h-index
7 publications
330 citations
FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic
Prague, Czechia
6 h-index
6 publications
232 citations

Chinese Academy of Sciences
Beijing, China
6 h-index
6 publications
220 citations

Oak Ridge National Laboratory
Oak Ridge, United States
6 h-index
6 publications
380 citations

Tohoku University
Sendai, Japan
6 h-index
6 publications
271 citations

Imperial College London
London, United Kingdom
6 h-index
6 publications
259 citations
1–8 of 271
29 publications · 1.9K citations
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26 publications · 904 citations
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19 publications · 654 citations
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16 publications · 612 citations
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PRL · 10 publications · 699 citations
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