Electrical Interconnect Design
Electrical Interconnect Design is the systematic methodology within battery pack design and MEMS packaging that defines the configuration, materials, and geometric layout of conductive pathways to enable reliable electrical signal and power transmission between discrete components while minimizing resistance, thermal stress, and mechanical failure under operational conditions.
147
Publications
7.6K
Citations
610
Authors
163
Institutions
Publications per year
2017–2026
17
147
Er‐Ping Li, Xing‐Chang Wei, A.C. Cangellaris et al. · IEEE Transactions on Electromagnetic Compatibility · 2010 · 206 citations
Engineering, Computer Engineering, Electrical Engineering +17
1–5 of 147
610
5
h-index
4
h-index
3
h-index
3
h-index
3
h-index
1–5 of 610
163
University of California, Los Angeles
Los Angeles, United States
12 h-index
30 publications
2.3K citations
Georgia Institute of Technology
Atlanta, United States
12 h-index
53 publications
1.2K citations
Intel (United States)
Santa Clara, United States
6 h-index
25 publications
419 citations
University of Illinois Urbana-Champaign
Urbana, United States
5 h-index
25 publications
25.6K citations
University of Utah
Salt Lake City, United States
5 h-index
8 publications
1.1K citations

University of Rochester
Rochester, United States
5 h-index
18 publications
778 citations
Hewlett-Packard (United States)
Palo Alto, United States
4 h-index
9 publications
670 citations
IBM (United States)
Armonk, United States
4 h-index
17 publications
600 citations
1–8 of 163
5 publications · 172 citations
5
h-index
4 publications · 148 citations
4
h-index
3 publications · 337 citations
3
h-index
3 publications · 155 citations
3
h-index
3 publications · 66 citations
3
h-index
1–5