Concepedia

Alignment Metrology

Alignment Metrology is a specialized branch of microfabrication metrology that quantifies the positional accuracy and overlay registration between successive layers or features in multilayered microscale devices, distinguished by its focus on interlayer alignment fidelity essential for device functionality and yield.

50

Publications

1.2K

Citations

190

Authors

78

Institutions

Publications per year

2017–2026

6

Parents

Publications

50

An ultraprecision stage for alignment of wafers in advanced microlithography

Changwoo Lee, Seung‐Woo Kim · Precision Engineering · 1997 · 160 citations

, , +12

Multilevel nanoimprint lithography with submicron alignment over 4 in. Si wafers

Wei Zhang, Stephen Y. Chou · Applied Physics Letters · 2001 · 81 citations

, , +14

Alignment of the CMS tracker with LHC and cosmic ray data

Journal of Instrumentation · 2014 · 53 citations · Full text

, , +15

Novel alignment system for imprint lithography

D. L. White, O. R. Wood · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 53 citations

, , +12

Digital moiré fringe measurement method for alignment in imprint lithography

Jinyou Shao, Yucheng Ding, Hongmiao Tian et al. · Optics & Laser Technology · 2011 · 38 citations

, , +12

1–5 of 50

Authors

190

  1. PL
    Philippe Leray

    IMEC, Belgium

    3 publications · 40 citations

    3

    h-index

  2. PT
    Patrick Tinnemans

    IMEC, Belgium

    2 publications · 28 citations

    2

    h-index

  3. CW
    Chenxi Wang

    Harbin Institute of Technology, China

    2 publications · 35 citations

    2

    h-index

  4. RS
    Robert Socha

    ASML (Netherlands), Netherlands

    2 publications · 28 citations

    2

    h-index

  5. XY
    Xiangyan Yuan

    Nanjing Institute of Astronomical Optics & Technology, China

    2 publications · 26 citations

    2

    h-index

1–5 of 190

Institutions

78

  1. Mapper Lithography (Netherlands)

    Delft, Netherlands

    3 h-index

    6 publications

    149 citations

  2. IMEC

    Leuven, Belgium

    3 h-index

    5 publications

    68 citations

  3. Carnegie Mellon University

    Pittsburgh, United States

    3 h-index

    5 publications

    129 citations

  4. IBM (United States)

    Armonk, United States

    3 h-index

    5 publications

    88 citations

  5. Philips (Netherlands)

    Amsterdam, The Netherlands

    3 h-index

    6 publications

    72 citations

  6. Bunkyo University

    Tokyo, Japan

    2 h-index

    4 publications

    70 citations

  7. ASML (Netherlands)

    Veldhoven, The Netherlands

    2 h-index

    10 publications

    132 citations

  8. Nikon (Japan)

    Tokyo, Japan

    2 h-index

    8 publications

    134 citations

1–8 of 78

Venues

  1. 10

    h-index

  2. Precision Engineering

    3 publications · 210 citations

    3

    h-index

  3. Optics and Lasers in Engineering

    3 publications · 75 citations

    3

    h-index

  4. 3

    h-index

  5. IEEE Transactions on Nanotechnology

    2 publications · 37 citations

    2

    h-index

1–5